Includes bibliographies and index.
|Statement||edited by R. Rompe and M. Steenbeck ; [translated from the original German].|
|Contributions||Rompe, Robert., Steenbeck, Max, 1904-|
|LC Classifications||QC718 .P79|
|The Physical Object|
|LC Control Number||76364294|
He pioneered innovative plasma processing technologies based on atmospheric pressure plasmas and is exploring the frontier of Plasma Catalysis, Natural gas conversion, Power-to-Gas, and silicon nanoparticle synthesis and photovoltaic application. He is the author of more than publications including several book chapters. Plasma Science and Technology - Progress in Physical States and Chemical Reactions. Edited by: Tetsu Mieno. eISBN , PDF ISBN , Published Author: Tetsu Mieno. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. "This book discusses the fundamental principles of partially ionized, chemically reactive plasma discharges and their use in thin film processing a well-written book for plasma engineers and scientists. [they] will benefit a lot from this book " —Hong-Young Chang, Professor, Korean Advanced Institute of Science and Technology (KAIST).
This book covers new contents besides the basic plasma stuffs although the title is fundamentals of plasma physics. Those who are interested in the application of plasma, this book may be helpful. But if a reader prefers fundamental plasma physics, it is better to start some other books before reading this larep-immo.com by: Plasma Engineering is the first textbook that addresses plasma engineering in the aerospace, nanotechnology, and bioengineering fields from a unified standpoint. It covers the fundamentals of plasma physics at a level suitable for an upper level undergraduate or graduate student, and applies the unique properties of plasmas (ionized gases) to improve processes and performance over a wide. The book and software provide concise, exhaustive, and clear descriptions of terms, notations, concepts, methods, laws, and techniques. It is invaluable for students and engineers who are determined to more accurately predict the physical and chemical processes in gas and plasma dynamics. The main focus of this manuscript to gain an understanding of gaseous ionization and ion transport in relation to gas discharges. However, for the uninitiated, even these terms may be unfamiliar. Therefore, it is best to begin with a short discussion of the basic concepts. What is a gas discharge or plasma?
In the twenty-first century, the further development of applications of plasma physics and plasma chemistry is certainly expected. In this book, 18 chapters on the recent progress in plasma science and technology have been written by active specialists worldwide. This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which. Unfortunately, this book can't be printed from the OpenBook. If you need to print pages from this book, we recommend downloading it as a PDF. Visit larep-immo.com to get more information about this book, to buy it in print, or to download it as a free PDF. Below is the uncorrected machine-read text. Press , s. ISBN 0 19 X  Russ A. Morgan.: Plasma etching in semiconductor fabrication, Amsterdam: Elsevier, - x, s. ISBN